7 плазменные источники

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  • 1. OOO , . Presentation for Grant Committee , 29 2012, 4, 2012

2. , . : p-n .. 28 . ( , .. , , 90 .) 3500 M$ . 75 M$ .:, , , : , . : + . - 24 . . 2012 . 18 . ./ , . 6 ..2 3. 3500 M$. - 10- 15% (350 -500 M$ ). 5 - 20 % . - - 2010 . > 280 000 M$. < 5-10 % . 7 . 75 M$ . , 85% 15% . . 3 4. :! (P2, P3,P4) 10 10 /. . 140 2! (B10H11), 1 1 /. . 120 2.! 450 (18 ) 300 2-10 5. A) . P4+. - 1 /. . 140 2 , . 36 +0.10 small window +P2 P4+ P 30+0.08 PH+PH3 24I magnit (A) I beams (mA)0.06 180.04 + P3120.02 60.00 0 04.06.12 5 6. B) (, .). , . : 1 , 1 /2. 0,0125 Carborane spectrum 0,0100 Current, ar.un. 0,0075 0,0050 0,0025 0,0000 0 20 40 60 80 100 120 140 160 180 Mass, amu6 7. C) . . : 95% . 1011 -3. ( ) . U, I, 0,6011 + B-20,4 -4 10 + 0,2B +++ Kr Kr0 0,0 2,0x10-6 t, -64,0x106,0x10 -67 8. : . , . (CRDF) . ( 10 2.5 $) - , - (Axelis Technologies Varian Semiconductor Equipment, ). Varian Semiconductor Equipment , . -. 8 9. : - (A, B & C). . . - . . - . . : (217 ), , () (). , (Axelis Technologies Varian Semiconductor Equipment), 75% 2,5 M$ .9 10. : ! , :! , . , , (RDF), (ISTC)! :! :! . (, , ..) :! .! , :! , .! :- : , , , , .